1. Appearance size: 4200mm (L) χ 1700mm (W) χ 1950mm (H)
2. Feeding area: It can hold 20 trays of 625mm χ 505 mm tray, Max 35 fixtures for one plate, up to 700 fixtures for one feeding Max, and a KY-400 high vacuum molecular pump or 10 for automatic feeding tray structure. FCryo pump and low vacuum pump combination with Rotary pump + Booster, pumping rate up to 10000 L/hr
3. Coating process area: This area is designed with a total of 8 sputtering cathodes, using four upper and lower four, and designed in a bilaterally symmetric manner. A 10FCryo pump is arranged, and one (two total) square gate valves are arranged in front and rear. Keep the feed and discharge in a vacuum.
4. Discharge area: 20 trays, Max700 fixtures, one-time automatic receipt mechanism.
5.Electronic control device area: It adopts Mitsubishi PLC of Japan, with high reliability and easy maintenance.
Two: design concept:
The concept of Simple Is The Best is adopted. Make a comprehensive consideration of the following issues:
• Cavity size
• Institutional design
• Pumping system design
• Target replacement convenience
• Equipment maintenance
• Coating quality requirements
• Software function design
• Productivity
Three: system features
• The cavity is modular in design, easy to handle and combine, and the mechanism is easy to adjust
• Automatic feeding and receiving system
• Multi-target sputtering for fast production
• High integration of hardware and software to reduce the possibility of human error
• Graphical operation interface, easy to learn and operate, dynamic display device operation status
• Control circuit board takes up less space and is easy to maintain and check on the design
• It is easy to save by changing the target trolley.
Four: system configuration and system specifications
4.1 System Configuration:
| Item | Name | Specification Model | Quantity | Remarks |
| 1 | Vacuum chamber | Three-chamber stainless steel SUS304 | ||
| 2 | Magnetron sputtering cathode | 5”×22” | 8 | |
| 3 | DC sputtering power supply | 8KW（ADL） | 8 | Germany |
| 4 | Mechanical vacuum pump | ULVACVDN-902 | 1 | |
| 5 | High vacuum molecular pump | KY-400 molecular pump | 3 | Or cryopump CTI 10F |
| 6 | High vacuum refrigeration compressor | 9600 | 3 | |
| 7 | Mechanical vacuum pump+Booster | ULVAC VDN-902+NB600 | ||
| 8 | Shaft seal | Magnetic fluid vacuum | 5 | |
| 9 | Gate valve | 10” | 3 | |
| 10 | High and low vacuum gauge | United States G.P | altogether 4 | |
| 11 | Throttle Valve | Butterfly | 1 | |
| 12 | Automatic GAB flow control | Ar | 1 | |
| 13 | PLC touch system | 1 | ||
| 14 | Trays | 625mm x 525mm | 20 tablets | |
| 15 | Change target trolley | 1 set |
4.2 System specifications and technical indicators:
Control system
Adopt Mitsubishi PLC automatic control + human machine interface
2. Cavity Chamber
Material: SUS304 stainless steel material plus Water Jacket discharge area, feed area door material is aluminum alloy
3. Plasma source and target
Plasma source: magnetron sputtering source x 8, water-cooled <upper four targets, lower four targets> target size: 5” x 22”x 1/2” Target
Fixed method: Clamp type
4.DC power supply
MAX 8 KW water-cooled, German ADL
5. Vacuum pump
Low vacuum pump: Japan ULVAC VDN-902 + NB600 High vacuum pump: Cryo Pump US CTI 10 F
Compressor: CTI 9600 water-cooled
6. High vacuum pump reservation automatic regeneration function, with automatic filling N2 regeneration function
7. Transmission system
Motor: Japan-made Oriental (Oriental Motor) uses “magnetic fluid shaft seal” power transmission + chain transmission
8.Gate Valve
Square Gate Valve x 2 High Vacuum Gate Valve x 3 (US VR)
9. Vacuum Gauge
Low Vacuum Gauge: American G-P High Vacuum Gauge: American G-P
10. Mass flow meter (MFC)
Adopting the Japanese Aera brand Mass Flow Controller
11. A set of process disks (20 pcs) + a set of work trolleys
12. Software function:
• Process report record
• 10 groups of working parameters can be preset
• Alert history
• Arc alert
• Target change target warning
• Hardware action interlock, error action protection
13. System, water, electricity, gas source requirements:
• Power: 3PH, 220V, 260A
• Cooling water: 1.5kg/cm2
• Water temperature: 18-22 ° C, soft water, no condensation
• Compressed air 5-6.5kg/cm2
14. System vacuum:
• System ultimate vacuum <1.0×10-6Torr
• Leak detection rate: 1.0×10-8 TORR·L/S
15. Chain speed adjustable range and accuracy: 10 cm/min-100cm/min
16. Suitable for medium and small substrate fixtures used in end conduction.
17. Various protection functions of the equipment: cathode cover protection switch, high vacuum gate valve and low vacuum interlock protection, cooling water independent protection switch, water temperature monitoring, etc.
Five: Other instructions:
Productivity
1-1 equipment capacity (0603): 142 (bar) × 70 (grain) × 35 (fixture) × 20 (disc) × 36 (2 hr / 40 min) × 30 days × 85% (product rate) = 6 billion pcs /month
1-2 production cycle: about 40 minutes
1-3 regeneration time: about 3 hours (exhaustion 1.5 hours, regeneration 1.5 hours)
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